MIDLAND, Mich. and GARCHING, Germany — Dow Corning, supplier of advanced silicon technology and materials to the semiconductor industry, and SUSS MicroTec, supplier of semiconductor processing equipment, announce their collaboration on a temporary bonding solution for 3D through-silicon via (TSV) semiconductor packaging. As part of this non-exclusive agreement, the companies are developing a material and equipment system solution for high-volume manufacturing of 3D TSV packaged devices. Through the collaboration, Dow Corning and SUSS MicroTec are working to overcome the challenges the market is facing in advancing 3D TSV and 3D wafer level packaging (WLP) commercialization.
Comprised of both an adhesive and release layer, the Dow Corning silicon-based material is optimized for simple processing with a bi-layer spin coating and bonding process. Combined with SUSS MicroTec equipment, the total solution offers the benefits of simple bonding using standard manufacturing methods and provides compatibility with thermal and chemical requirements for via middle and interposer TSV processing, as well as faster room temperature de-bonding required for advanced packaging applications.
Enabling commercialization of TSV technology will allow semiconductor companies to reduce the form factor of semiconductor packages to meet continued consumer demand for smaller, thinner and faster electronic devices with increased functionality. Stacking two or more chips vertically using TSV technology is one of the viable ways to reduce the footprint on the printed circuit board (PCB), though requires the industry to find a solution for handling thin wafers, using temporary bonding.